JPS6236532U - - Google Patents

Info

Publication number
JPS6236532U
JPS6236532U JP12797485U JP12797485U JPS6236532U JP S6236532 U JPS6236532 U JP S6236532U JP 12797485 U JP12797485 U JP 12797485U JP 12797485 U JP12797485 U JP 12797485U JP S6236532 U JPS6236532 U JP S6236532U
Authority
JP
Japan
Prior art keywords
wafer
intensity
exposure
light source
reduction projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12797485U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0416424Y2 (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985127974U priority Critical patent/JPH0416424Y2/ja
Publication of JPS6236532U publication Critical patent/JPS6236532U/ja
Application granted granted Critical
Publication of JPH0416424Y2 publication Critical patent/JPH0416424Y2/ja
Expired legal-status Critical Current

Links

JP1985127974U 1985-08-20 1985-08-20 Expired JPH0416424Y2 (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985127974U JPH0416424Y2 (en]) 1985-08-20 1985-08-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985127974U JPH0416424Y2 (en]) 1985-08-20 1985-08-20

Publications (2)

Publication Number Publication Date
JPS6236532U true JPS6236532U (en]) 1987-03-04
JPH0416424Y2 JPH0416424Y2 (en]) 1992-04-13

Family

ID=31023222

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985127974U Expired JPH0416424Y2 (en]) 1985-08-20 1985-08-20

Country Status (1)

Country Link
JP (1) JPH0416424Y2 (en])

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5068066A (en]) * 1973-10-17 1975-06-07
JPS60177623A (ja) * 1984-02-24 1985-09-11 Hitachi Ltd 露光装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5068066A (en]) * 1973-10-17 1975-06-07
JPS60177623A (ja) * 1984-02-24 1985-09-11 Hitachi Ltd 露光装置

Also Published As

Publication number Publication date
JPH0416424Y2 (en]) 1992-04-13

Similar Documents

Publication Publication Date Title
JPH0650714B2 (ja) 露光方法
JPS5830736B2 (ja) 半導体基板上のマスクのパタ−ンを投影印刷する装置
GB1461685A (en) Method and means for forming an aligned mask that does not include alignment marks employed in aligning the mask
JP3359193B2 (ja) 露光装置及びそれを用いたデバイスの製造方法
JPS6236532U (en])
JPS6468926A (en) Measurement of image distortion in projection optical system
JPS60177623A (ja) 露光装置
JPH0666246B2 (ja) 照明光学系
JPH0664337B2 (ja) 半導体集積回路用ホトマスク
JPH01187924A (ja) 露光装置
JPH0225851A (ja) 露光方法
JPH0225852A (ja) 露光装置
JP3056598B2 (ja) 露光装置とアライメント精度測定方法
JPH0260227U (en])
JP2884767B2 (ja) 観察装置
JPS62217250A (ja) 焦点合わせ方法
JPH046559A (ja) ペリクルの透過率測定方法
JPS58162954A (ja) 投影型露光装置
JPS5768023A (en) Mask alignment device
JPH03156347A (ja) 透過率測定方法
JPH022103A (ja) 露光装置
JPS62112140U (en])
JPH03154054A (ja) フォトマスク
JPS6473617A (en) Aligning method of projection system
JPH09288345A (ja) 投影プリント用マスク